Hexamethyldisiloxane can be used To fabricate a gas diffusion layer (GDL) with controlled hydrophobic silicone nano-layer by the dry deposition process. To prepare silver nanoparticles coated with silica using arginine and glucose as the catalyst and the reducing agent respectively.

For R&D use onlynot for drug household or other uses.

Hexamethyldisiloxane (HMDSO) a linear polydisiloxaneis an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds.It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry.