Hydrogen peroxide PurTrace Ultrapure for Ultra Trace Analysis 30-32 %
PurTrace Ultrapure
Properties
| Vapour pressure | (20 ºC) ~ 18 hPa |
| Water Solubility | miscible |
| Assay Purity | 30 – 32 % |
| B pt. | 107 ºC |
| M pt. | -26ºC |
| Density | 1,11 g/cm3 |
Safety Information
| Hazard Statement(s) | H302+H332-H318 |
| Precautionary Statement | P280-P310-P501-P301+P312-P305+P351+P338 |
| Symbol | |
| Signal word | Danger |
| Storage Temp. | Store at Room Temperature. |
| UN Number | 2014 |
Description
Application
Used in trace metal analysis (ICP-MS AAS) semiconductor wafer cleaning DNAprotein extraction and as an oxidant in ultra-pure chemical synthesis where contamination must be minimized.
Purpose
Its purpose is providing a high-purity oxidizing agent for analytical labs ensuring no interference from metal contaminants in ultra-trace detections and sensitive electronic manufacturing.
General Description
Hydrogen peroxide Ultrapure for Ultra Trace Analysis (30-32% ww CAS 7722-84-1) is a clear colorless liquid (HO MW 34.01 gmol) with low trace metal impurities (ppb levels for Na K Ca Mg etc.) density 1.11 gcm at 20C boiling point 108C and freezing point -33C. It is stabilized minimally to prevent decomposition with pH 3.3 and vapor pressure 23 mmHg at 30C.
Documents
| SDS | |
| COA | |
| Specification | |
| Bulk quote order form |