Chromium etchant containing cerium is used to remove thin layers of chromium from glass silicon wafers and metal surfaces during manufacturing and microfabrication processes.

The purpose of chromium etchant with cerium is to selectively dissolve chromium without significantly damaging the underlying material allowing precise patterning and surface preparation.

Chromium etchant with cerium is a chemical solution that typically contains ceric ammonium nitrate along with acids such as nitric or acetic acid to efficiently oxidize and dissolve chromium coatings. It is commonly used in electronics semiconductor fabrication and photolithography.