Hydrogen peroxide PurTrace Ultrapure for Ultra Trace Analysis, 30-32 % (below 10 ppt)
PurTrace Ultrapure
Synonym: Peroxol; Perhydroxic acid
Linear Formula:
H2O2
Molecular Weight: 34.01 g/mol
CAS Number: 7722-84-1
Properties
| Vapour pressure | 93 hPa at 50 °C |
| Water Solubility | Completely Miscible |
| Autoignition temp. | Not applicable |
| Explosion limit | Not applicable |
| Assay Purity | 30-32 % |
| B pt. | Decomposes on heating |
| M pt. | -26°C |
| Density | 1.11 g/cm3 at 20 °C |
| Form | Liquid |
Safety Information
| Hazard Statement(s) | H302-H318 |
| Precautionary Statement | P260-P280-P301 + P330 + P331-P305 + P351 + P338-P308 + P313 |
| GHS Pictogram |
|
| Signal word | Danger |
| Flash point | Notapplicable |
| Storage Temp. | Room Temperature |
| UN Number | 2014 |
Description
Application
Used in wafer cleaning photoresist removal and chemical mechanical planarization (CMP) in microelectronics. Also for trace metal analysis in environmental and pharmaceutical testing.
Purpose
Provides contamination-free oxidation and cleaning where even ppb-level impurities affect device performance and yield.
General Description
Hydrogen peroxide PurTrace Ultrapure is a high-purity grade of HO designed for semiconductor manufacturing and trace analysis applications.
Documents
| SDS | |
| COA | |
| Specification | |
| Bulk quote order form | |
| Sample COA |