This ultra-high-purity grade is primarily used for trace metal analysis (like ICP-MS or AAS) and semiconductor manufacturing where its extremely low mercury content prevents interference with sensitive measurements and electronic components.

Provides a low-Hg matrix for accurate trace mercury quantification and ultrasensitive assays preventing contamination in high-precision analytical chemistry.

This is a concentrated nitric acid (HNO) solution typically 65-67% assay (titration) with density 1.37-1.41 gmL at 20C and pH 1.0. It meets puriss. p.a. (pro analysis) standards ensuring minimal impurities like chloride 0.5 mgkg sulfate 1 mgkg and especially mercury 0.005 mgkg for mercury-free applications.